Added initial support for equivalent poly layers.
Differential chain patterns will not just stack each step. They will now generate split inrow steps, if appropriate, as well as stacking.
Differential chain patterns now handle some branching cases in the critical path.
Differential chain patterns now generate all lengths of path, rather than just the longest.
Fixed a bug causing LVS errors due to adding nwell over RF NMOS devices.
Fixed a case where additional power rail to guard ring via was not removed under certain conditions.
Fixed some cases where capacitors could be handled as standard cell rows, rather than cell grids and fixed an issue with the estimate size of these rows.